Allwin21 Corp （www.allwin21.com） 是一家總部設在美國硅谷的專業(yè)半導體設備與技術服務公司。我公司可提供全新的或翻新的快速退火爐或保護氣氛熱處理爐Heatpulse  AG610 、AG4100 、AG8108系列用于退火工藝或熱處理工藝; 去膠（打膠）機  GASONICS AURA 1000系列; AE 2001 AE 2000LLL; 去膠（打膠）機MATRIX 105/106/303/403系列 ;及TEGAL 901/903 等離子刻蝕機;EG2001/2010/1034探針臺;HP4062/HP4145測試儀;AW-PCM測試軟件

 Allwin21 Corp 于2006年10月從應用材料(Applied Materials)取得全球*生產、銷售、服務AG Heatpulse 210,AG Heatpulse 410,AG Heatpulse 610的經(jīng)營權。Allwin21 Corp.在AG Heatpulse 610的基礎上，結合她自主開發(fā)的全新GUI控制軟件及精確的溫度控制技術，生產、制造AccuThermo AW 410,AccuThermo AW 610,AccuThermo AW 810桌上型保護氣氛熱處理爐。 產品使用： 離子注入后快速退火；
歐姆接觸快速合金；
硅化物合金退火；
氧化物生長； Solar Cell 太陽能電池 LED 化合物材料研究 納米材料研究 MEMS研究
其它快速熱處理工藝。 產品特點：1．先進的GUI圖形軟件；2．精確的溫度控制技術；3．具備power summary功能；4．先進的ERP高溫計；5．冷壁系統(tǒng)；6．zui多4路工藝氣體，MFC控制；7．單片，閉環(huán)溫度控制；8．快速升溫與降溫控制：10-150 C/秒9．工藝重復性好；10．  軟件校準，精確方便；11．  軟件界面顯示設備全部信息，方便維修、使用； 同一般管式高溫爐的比較: 一般管式高溫爐只能一個工藝條件，即一個溫度；工藝周期長，使用不太靈活；須24小時加電恒溫，能耗較高. 快速退火爐，可以設多個工藝條件，即多種溫度；工藝時間短，使用非常靈活；能耗很低；同一臺設備既可用作生產，也可用作科研，且任何科研工藝條件不會對生產工藝造成影響

Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610.  Allwin21 is manufacturing the AccuThermo AW-610,AccuThermo AW 810,originally the AG Heatpulse 610.The AccuThermo AW-610,AccuThermo AW 810 have innovative softwaremore advanced temperature control technologies.

AccuThermo AW 610 is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber''s cold-wall design, superior heating uniformity advanced temperature control technologyAW 900 new software, provide significant advantages over conventional furnace processingconventional RTP systems. 

Rapid thermal processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. The wafers must be brought down (temperature) slow enough however, so they do not break due to thermal shock..Such rapid heating rates are attained by high intensity lamps process. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflowchemical vapor deposition.

Rapid thermal anneal (RTA) is a process used in semiconductor device fabrication which consists of heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film-to-film or film-to-wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from ion implantation, move dopants or drive dopants from one film into another or from a film into the wafer substrate. Rapid thermal anneals are performed by equipment that heats a single wafer at a time using lamp based heating that a wafer is brought near. Unlike furnace anneals they are short in duration, processing each wafer in several minutes. Rapid thermal anneal is a subset of processes called Rapid Thermal Process (RTP).

AG Associates Heatpulse is one of the most famous RTP equipment manufacturers. Many Integrated Chip companies, R D centers, Institutes all over the world have been using AG Heatpulse Systems. 

Allwin21 Corp can provide the following refurbished RTP equipment AG Heatpulse 210 AG Heatpulse 410 AG Heatpulse 610 AG Heatpulse 2100 AG Heatpulse 4100 AG Heatpulse 4100S AG Heatpulse 4108 

  Heatpulse 210     Heatpulse 610   Heatpulse 4100 

Allwin21 Corp. can also provide  Allwin21 Corp proprietary AW Control SoftwareSuperior Temperature Control Technology  to upgrade the refurbished equipment which provides the following significant advantages Integrated process control system Real time graphics display Real time process data acquisition, display,analysis Programmed comprehensive calibrationdiagnostic functions Better performancemaintenance than the original systems

Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610.  Allwin21 is manufacturing the AccuThermo AW-610,originally the AG Heatpulse 610.The AccuThermo AW-610 has innovative softwaremore advanced temperature control technologies.

 New AccuThermo AW 610

New AccuThermo AW 810M

 Download AccuThermo AW 610 Catalog

AccuThermo  AW 610 s key features include:  Advanced ERP Pyrometer for precise high temperature measurement Add timer watch for the oven safety issue (the original  has no safety interlock for the computer locks up, chamber would be burned if the computer locks up when process running). The new software with power summary function to detect either lamp failure or sensor failure  Manual Operation Use Sumpower as a parameter to control the uniformity of the wafer. Closed-loop temperature control with pyrometer or thermocouple temperature sensing. Precise time-temperature profiles tailored to suit specific process requirements. High-intensity visible radiation heats wafers for short periods. Fast heatingcooling rates unobtainable in conventional technologies. Consistent wafer-to-wafer process cycle repeatability. Elimination of external contamination. Small footprintenergy efficiency. Software calibrationeasy to be done. More functionsI/O hardware exposed for easier maintenancetrouble shooting. It is easy to edit recipe with GUIgraph display. Save all process data on the computer hard disk. A/DD/A precision is 14 to 16 bits. Detect in processwith color curve displayed on the screen. Lamp damage detect in process.  Sensor status detect function. On line help function

AccuThermo AW 610 RTA RTP is a versatile tool, which is useful for many applications:
Ion Implant Activation
Polysilicon Annealing
Oxide Reflow
Silicide Formation
Contact Alloying
OxidationNitridation
GaAs Processing
For a bibliographyreprints of technical journal articles regarding these AccuTherm  applications, contact the Allwin21 Corp. Marketing Communications Department.